G2 Humidity Generator

G2 Humidity Generator

Description

The G2 produces highly accurate humidity values based on RH Systems’ unique hybrid combination of the NIST proven “two-pressure” and “two-temperature” humidity generation techniques. It delivers a humidified gas stream, accurately controlled to a variety of user selectable humidity parameters such as %RH, dew point, frost point, ppm, or vapor pressure.

Features
Precise generation of humidity controlled gas flow
High accuracy two-pressure / two-temperature principle
Flow rates up to 100 liters per minute
Flow rates up to 100 liters per minute

Description

The G2 produces highly accurate humidity values based on RH Systems’ unique hybrid combination of the NIST proven “two-pressure” and “two-temperature” humidity generation techniques. It delivers a humidified gas stream, accurately controlled to a variety of user selectable humidity parameters such as %RH, dew point, frost point, ppm, or vapor pressure. By accurately measuring the temperature and pressure at the point where the humidified gas is utilized, the G2 automatically adjusts for changes in dynamic conditions such as heat load or ambient pressure variation.

 

 

Features

  • Precise generation of humidity controlled gas flow
  • High accuracy two-pressure / two-temperature principle
  • Flow rates up to 100 liters per minute
  • Controls %RH, Dew Point, or other humidity parameters
  • Simultaneous measurement of up to 3 external temperature probes
  • Measurement of pressure and temperature at point of gas use
  • PC software for system control and data acquisition
  • Optional touch panel for control and status indication

 

 

Key Specifications

Generator Ranges

Frost/dew point: -25...90 °C

Relative humidity: 0.5...99 %RH

Flow rate: 3...100 l/min

Saturation Pressure: Ambient...12 bar (Ambient...175 psia)

 

Measurement Ranges

External temperature sensor: -50...100 °C

External pressure sensor: 700...1,200 mbar (10.2...17.4 psia)

 

Performance

Dew point stability: ≤ ±0.02 °C

RH Stability: ≤ ±0.1 %RH

Pressure Stability: ≤ ±1 mbar (0.015 psia)

Saturator temperature stability: ≤ ±0.01 °C

Flow control: ≤ ±0.5% of full scale

Response time: 10...90 %RH < 5 min

 

 

Applications

  • High volume production calibration systems
  • Humidity control in semiconductor manufacturing and lithography processes
  • Add humidity control to existing temperature chambers